On May 15–16, the Workshop on Bulk Crystal Growth and Epitaxy took place in Warsaw. The event was hosted by the Polish Crystal Growth Society and the Institute of High-Pressure Physics of the Polish Academy of Sciences.

The workshop was a forum for scientists from all over the country involved in crystal growth and broadly understood epitaxy and characterization.

We couldn’t miss it — as part of the invited lecture, we presented the results of our latest research on the prospects of using graphene epistaxis on SiC for magnetic diagnostics of future fusion devices:

Epitaxial graphene technology for the future nuclear industry

In addition to the DoSPaN team, representatives of the Institute of Materials Research and Quantum Engineering of our faculty also took part in the workshop, presenting the subject of luminescent properties of Bi3TeBO9 crystalline materials doped with rare earth ions.

We will come back for the next edition!