We are pleased to announce the installation of a new thin-film deposition system – HEX by Korvus Technology – at SENSOR LAB. This advanced modular vacuum platform has been designed for research on functional materials, nanostructures, and surface physics. As part of an Institute-wide collaboration with the Molecular Physics Division and the Computational Physics and Nanomechanics Division, we have expanded the infrastructure of the Institute of Physics, enhancing our fabrication and preparation capabilities.

In its current configuration, the HEX system is equipped with an RF magnetron source, enabling thin-film deposition of various materials via the sputtering technique, and a thermal ORCA source, allowing the growth of layers with exceptional purity, uniformity, and precise compositional control. The system can also be configured to apply a substrate bias voltage, enabling pre-deposition surface treatment such as ion cleaning or adhesion modification prior to film growth.

This setup now enables precise deposition of various types of active layers (for sensor structures and beyond) — including semiconductor films, passivation coatings, and metallic contacts — with excellent control over thickness and composition. It also supports the fabrication of 2D heterostructures and thin-film stacks, which can later be integrated into more complex layered systems. The integration of the HEX system with the SENSOR LAB infrastructure opens new pathways for the development of magnetic sensors, 2D materials, and functional thin films, as well as for the experimental optimization of structures designed to operate under extreme environmental conditions.

In our >>> GALLERY <<< you will find several shots of the new system.